URN:NBN:SI:DOC-6ESNQBL62012Chaouki, BenazzouzFouzia, ZekkarMahfoud, BenkerriMokhtar, BoudissaMounir, ReffasNasser, Mennidocuments/doc/6/URN_NBN_SI_doc-6ESNQBL6_001.htmdocuments/doc/6/URN_NBN_SI_doc-6ESNQBL6_001.pdfdocuments/doc/6/URN_NBN_SI_doc-6ESNQBL6_001.txt246articlestr. 139-1441580-2949929962URN:NBN:SI:doc-6ESNQBL6engInštitut za kovinske materiale in tehnologijeMateriali in tehnologijeInCantimonantimonybakerbakrov silicidcoppercopper silicidediffusiondifrakcija rentgenskih žarkovdifuzijaPVDscanning electron microscopytanke plastithin filmvrstična elektronska mikroskopijaX-ray diffractionEffect of the antimony thin-film deposition sequence on copper-silicon interdiffusionVpliv zaporedja nanosa tankih plasti antimona na interdifuzijo baker-silicij