<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:DOC-EGXLCILB</identifier><date>2017</date><creator>Arshad, Mohd Khairuddin Md</creator><creator>Fathil, M. F. M.</creator><creator>Gopinath, Subash C. B.</creator><creator>Hashim, U.</creator><creator>See, J. H.</creator><creator>Voon, C. H.</creator><relation>documents/doc/E/URN_NBN_SI_doc-EGXLCILB_001.pdf</relation><relation>documents/doc/E/URN_NBN_SI_doc-EGXLCILB_001.txt</relation><format format_type="issue">1</format><format format_type="volume">47</format><format format_type="type">article</format><format format_type="extent">str. 24-31</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID_HOST">12052820</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-EGXLCILB</identifier><language>eng</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="eng">breakdown voltage</subject><subject language_type_id="eng">forward voltage</subject><subject language_type_id="slv">močnostne naprave</subject><subject language_type_id="eng">power device</subject><subject language_type_id="slv">prevodna napetost</subject><subject language_type_id="slv">zaporna napetost</subject><title>DOE study of epitaxial layer thickness and resistivity effects on P-i-N diode for beyond 300 V of reverse voltage applications</title><title>Načrtovanje eksperimenta vplivov debeline in upornosti epitaksijske plasti P-i-N diode pri reverznih napetostih nad 300 V</title></Record>