<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:DOC-JWM7V5AC</identifier><date>1993</date><creator>Aljančič, Uroš</creator><creator>Amon, Slavko</creator><creator>Resnik, Drago</creator><creator>Vrtačnik, Danilo</creator><relation>documents/doc/J/URN_NBN_SI_doc-JWM7V5AC_001.pdf</relation><relation>documents/doc/J/URN_NBN_SI_doc-JWM7V5AC_001.txt</relation><format format_type="issue">1</format><format format_type="volume">23</format><format format_type="type">article</format><format format_type="extent">str. 10-16</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID">602964</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-JWM7V5AC</identifier><language>eng</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="slv">membrane</subject><subject language_type_id="slv">mikroelektronika</subject><subject language_type_id="slv">površine</subject><subject language_type_id="slv">senzorji tlaka</subject><subject language_type_id="slv">silicij</subject><title>Surface smoothness of anisotropically etched (100) silicon</title></Record>